POROUS SILICON - BASE MATERIAL FOR NANOTECHNOLOGIES

Authors
JESKE M SCHULTZE JW MUNDER H
Citation
M. Jeske et al., POROUS SILICON - BASE MATERIAL FOR NANOTECHNOLOGIES, Electrochimica acta, 40(10), 1995, pp. 1435-1438
Citations number
14
Categorie Soggetti
Electrochemistry
Journal title
Electrochimica acta → ACNP
ISSN journal
00134686
Volume
40
Issue
10
Year of publication
1995
Pages
1435 - 1438
Database
ISI
SICI code
0013-4686(1995)40:10<1435:PS-BMF>2.0.ZU;2-7
Abstract
Porous Silicon as regular nanostructured material is used for an elect rochemical preparation of different binary and ternary nanostructured compound systems. The nanostructured films are analysed by means of XP S and sputter depth profiling.