NANOSCALE STUDIES OF AG ELECTRODEPOSITION OM HOPG(0001)

Citation
Rt. Potzschke et al., NANOSCALE STUDIES OF AG ELECTRODEPOSITION OM HOPG(0001), Electrochimica acta, 40(10), 1995, pp. 1469-1474
Citations number
17
Categorie Soggetti
Electrochemistry
Journal title
ISSN journal
00134686
Volume
40
Issue
10
Year of publication
1995
Pages
1469 - 1474
Database
ISI
SICI code
0013-4686(1995)40:10<1469:NSOAEO>2.0.ZU;2-T
Abstract
The electrodeposition of Ag on HOPG (0001) substrate is studied using conventional electrochemical methods (cyclic voltammetry, chronoampero metry) and in situ scanning tunnelling microscopy (STM). Due to a weak substrate-deposit interaction the deposition of kg occurs according t o a Volmer-Weber island growth mechanism. At relatively low overpotent ials the electrodeposition reaction is mainly initiated on steps and o ther surface defects. The initial deposition kinetics can be described by a model involving progressive nucleation on active sites and diffu sion-controlled 3-D growth. The analysis of experimental results shows that the 4-atomic Ag cluster represents the critical nucleus in the o verpotential interval -35mV < eta < -10mV. It is demonstrated that loc al nanoscale deposition of Ag on flat HOPG (0001) terraces can be indu ced using STM technique and specific pulse polarisation routines.