The electrodeposition of Ag on HOPG (0001) substrate is studied using
conventional electrochemical methods (cyclic voltammetry, chronoampero
metry) and in situ scanning tunnelling microscopy (STM). Due to a weak
substrate-deposit interaction the deposition of kg occurs according t
o a Volmer-Weber island growth mechanism. At relatively low overpotent
ials the electrodeposition reaction is mainly initiated on steps and o
ther surface defects. The initial deposition kinetics can be described
by a model involving progressive nucleation on active sites and diffu
sion-controlled 3-D growth. The analysis of experimental results shows
that the 4-atomic Ag cluster represents the critical nucleus in the o
verpotential interval -35mV < eta < -10mV. It is demonstrated that loc
al nanoscale deposition of Ag on flat HOPG (0001) terraces can be indu
ced using STM technique and specific pulse polarisation routines.