AN IN-SITU SCANNING PROBE MICROSCOPY STUDY OF COPPER ELECTRODEPOSITION ON CONDUCTIVE POLYPYRROLE

Citation
Rj. Nichols et al., AN IN-SITU SCANNING PROBE MICROSCOPY STUDY OF COPPER ELECTRODEPOSITION ON CONDUCTIVE POLYPYRROLE, Electrochimica acta, 40(10), 1995, pp. 1479-1485
Citations number
14
Categorie Soggetti
Electrochemistry
Journal title
ISSN journal
00134686
Volume
40
Issue
10
Year of publication
1995
Pages
1479 - 1485
Database
ISI
SICI code
0013-4686(1995)40:10<1479:AISPMS>2.0.ZU;2-0
Abstract
The initial stages of copper electrodeposition onto conductive polypyr role have been directly examined with in situ scanning probe microscop y (SPM). The deposition of copper onto polypyrrole is compared with th e deposition of copper onto gold. We have examined copper deposition f rom additive-free electrolytes and also electrolytes containing an org anic additive (a benzothiazole derivative, BTD). Copper electrodeposit ion in the absence of additives is characterised by an instantaneous n ucleation and 3-dimensional growth of the copper deposit on both polyp yrrole and gold substrates. In the latter case the growth mode is Stra nski-Krastanov, since 3-D growth centres are formed directly on-top of the underpotentially deposited copper monolayer. The morphology of th e copper growth on polypyrrole is similar both in the presence or abse nce of BTD. In both cases the growth is Volmer-Weber. By contrast, the morphology of the copper growth on gold is dramatically affected by t his additive. in this case the copper deposit exhibits a quasi-2-D gro wth (quasi-Frank van der Merwe growth), with layer deposition occurrin g by a ''birth-and-spread'' mechanism. Possible reasons for the differ ences in the additive's influence upon the copper growth on gold and p olypyrrole are discussed.