REACTION-ENGINEERING MODELING OF LOW-PRESSURE METALORGANIC CHEMICAL-VAPOR-DEPOSITION OF NB2O5 THIN-FILM

Thin films of niobium oxide (V) were prepared by low-pressure metalorg anic chemical vapor deposition (LPMOCVD) from bis-dipivaloylmethanate niobium trichloride in a horizontal tube hot-wall reactor. The depende nce of growth rate, crystal orientation, morphology and chemical compo sition on operating conditions were studied experimentally. The profil e of the thin film grown on microscale trenches and the macroscopic gr owth rate distribution in the reactor were studied by micro/macro-nume rical simulations.