EPITAXIAL SIGEC WAVE-GUIDE PHOTODETECTOR GROWN ON SI SUBSTRATE WITH RESPONSE IN THE 1.3-1.55-MU-M WAVELENGTH RANGE

Citation
Fy. Huang et al., EPITAXIAL SIGEC WAVE-GUIDE PHOTODETECTOR GROWN ON SI SUBSTRATE WITH RESPONSE IN THE 1.3-1.55-MU-M WAVELENGTH RANGE, IEEE photonics technology letters, 9(2), 1997, pp. 229-231
Citations number
13
Categorie Soggetti
Optics,"Physics, Applied
ISSN journal
10411135
Volume
9
Issue
2
Year of publication
1997
Pages
229 - 231
Database
ISI
SICI code
1041-1135(1997)9:2<229:ESWPGO>2.0.ZU;2-W
Abstract
A Si-based waveguide photodetector with a response in the 1.3-1.55-mu m wavelength range is demonstrated. The active absorption layer of the pin photodiode consists of a SiGeC allov epitaxially grown on a Si su bstrate with a Ge content of 55% and a thickness of 800 Angstrom. The external quantum efficiency for a 400-mu m-long waveguide, measured by using a single-mode fiber coupled to the waveguide facet, is 0.2% at 1.55 mu m. The dark current density at peak photoresponse is 40 pA/mu m(2). The quantum efficiency can be further enhanced hy using multiple SiGeC layers as the absorber, Direct measurements of the absorption c oefficient for the alloy layer are also reported.