Fy. Huang et al., EPITAXIAL SIGEC WAVE-GUIDE PHOTODETECTOR GROWN ON SI SUBSTRATE WITH RESPONSE IN THE 1.3-1.55-MU-M WAVELENGTH RANGE, IEEE photonics technology letters, 9(2), 1997, pp. 229-231
A Si-based waveguide photodetector with a response in the 1.3-1.55-mu
m wavelength range is demonstrated. The active absorption layer of the
pin photodiode consists of a SiGeC allov epitaxially grown on a Si su
bstrate with a Ge content of 55% and a thickness of 800 Angstrom. The
external quantum efficiency for a 400-mu m-long waveguide, measured by
using a single-mode fiber coupled to the waveguide facet, is 0.2% at
1.55 mu m. The dark current density at peak photoresponse is 40 pA/mu
m(2). The quantum efficiency can be further enhanced hy using multiple
SiGeC layers as the absorber, Direct measurements of the absorption c
oefficient for the alloy layer are also reported.