INCREASED DEPOSITION RATE OF CHEMICALLY VAPOR-DEPOSITED DIAMOND IN A DIRECT-CURRENT ARCJET WITH A SECONDARY DISCHARGE

Authors
BALDWIN SK OWANO TG KRUGER CH
Citation
Sk. Baldwin et al., INCREASED DEPOSITION RATE OF CHEMICALLY VAPOR-DEPOSITED DIAMOND IN A DIRECT-CURRENT ARCJET WITH A SECONDARY DISCHARGE, Applied physics letters, 67(2), 1995, pp. 194-196
Citations number
13
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
67
Issue
2
Year of publication
1995
Pages
194 - 196
Database
ISI
SICI code
0003-6951(1995)67:2<194:IDROCV>2.0.ZU;2-B