VARIATION OF COMPOSITION OF SPUTTERED TIN FILMS AS A FUNCTION OF TARGET NITRIDATION, THERMAL ANNEAL, AND SUBSTRATE TOPOGRAPHY

Authors
TSAI W HODUL D SHENG T DEW S ROBBIE K BRETT MJ SMY T
Citation
W. Tsai et al., VARIATION OF COMPOSITION OF SPUTTERED TIN FILMS AS A FUNCTION OF TARGET NITRIDATION, THERMAL ANNEAL, AND SUBSTRATE TOPOGRAPHY, Applied physics letters, 67(2), 1995, pp. 220-222
Citations number
15
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
67
Issue
2
Year of publication
1995
Pages
220 - 222
Database
ISI
SICI code
0003-6951(1995)67:2<220:VOCOST>2.0.ZU;2-V