The quantitative determination and the depth profile analysis of non-c
onductive materials by SNMS and GDOES is possible using a high-frequen
cy sputtering technology for discharging. To improve the SNMS with HF
sputtering technology for the analysis of environmentally relevant oxi
dic dusts, a certified standard ash is used. The quantitative evaluati
on has shown a markedly excessive concentration for the alkali element
s. Another effect is the appearance of the mass m/e = 20, which can be
allocated to an Ar2+ ion. The influences of conductivity of the sampl
es, I-IF frequency, rate of sputtertime and of the target voltage on t
hese effects have been investigated.