Jge. Gardeniers et al., CHARACTERIZATION OF SOL-GEL PZT FILMS ON PT-COATED SUBSTRATES, Journal of micromechanics and microengineering, 5(2), 1995, pp. 153-155
A conventional sol-gel process was used to spin-cast PZT films on oxid
ized Si wafers coated with sputtered Pt layers. After annealing at 550
degrees C-800 degrees C, the resulting perovskite-type PZT films show
ed different textures and surface morphologies, depending on whether o
r not a Ti adhesion layer was used. If a Ti layer was present, Ti diff
usion into and through the Pt film leads to a compound Pt3Ti, which fa
cilitates crystallization of the perovskite PZT phase; without Ti, cry
stallization is more difficult and occurs via the growth of dendritic
crystallites. Several optical and electrical properties of the PZT fil
ms have been measured; the first results indicate high dielectric cons
tants (epsilon similar or equal to 480) and acceptable ferroelectric b
ehaviour.