G. Chollon et al., THERMAL-STABILITY OF A PCS-DERIVED SIC FIBER WITH A LOW-OXYGEN CONTENT (HI-NICALON), Journal of Materials Science, 32(2), 1997, pp. 327-347
The oxygen free Si-C fibre (Hi-Nicalon) consists of beta-SiC nanocryst
als (approximate to 5 nm) and stacked carbon layers of 2-3 nm in exten
sion, in the form of carbon network along the fibre. This microstructu
re gives rise to a high density, tensile strength, stiffness and elect
rical conductivity. With respect to a Si-C-O fibre (Nicalon NL202), th
e Si-C fibres have a much greater thermal stability owing to the absen
ce of the unstable SiOxCy phase. Despite its high chemical stability,
it is nevertheless subject to a slight structural evolution at high te
mperatures of both SiC and free carbon phases, beginning at pyrolysis
temperatures in the range 1200-1400 degrees C and improving with incre
asing pyrolysis temperature and annealing time. A moderate superficial
decomposition is also observed beyond 1400 degrees C, in the form of
a carbon enriched layer whose thickness increases as the pyrolysis tem
perature and annealing time are raised. The strength reduction at ambi
ent for pyrolysis temperatures below 1600 degrees C could be caused by
SiC coarsening or superficial degradation. Si-C fibres have a good ox
idation resistance up to 1400 degrees C, due to the formation of a pro
tective silica layer.