We report a new method for producing graded index polymethyl methacryl
ate (PMMA) waveguides using optical densification by angled x-ray expo
sure. The resulting larger refractive index near the surface of the wa
veguide serves to better isolate the guided light from potentially abs
orbing or scattering substrates than in waveguides of constant refract
ive index, We calculate that a 65 degrees angle exposure in 6-mu m-thi
ck planar PMMA waveguide shifts the peak of the fundamental mode profi
le similar to 0.5 mu m away from the substrate, Consistent with this r
esult, we measure a reduction In the propagation loss of PMMA planar w
aveguides on a Ni substrate from 1.5 dB/cm to 0.5 dB/cm after angle x-
ray exposure.