FLOW-INJECTION ANALYSIS OF HIGH CHLORIDE LEVELS IN ELECTROPLATING BATHS USING ONLINE DIALYSIS AND POTENTIOMETRIC DETECTION

Citation
An. Araujo et al., FLOW-INJECTION ANALYSIS OF HIGH CHLORIDE LEVELS IN ELECTROPLATING BATHS USING ONLINE DIALYSIS AND POTENTIOMETRIC DETECTION, Fresenius' journal of analytical chemistry, 351(7), 1995, pp. 614-617
Citations number
16
Categorie Soggetti
Chemistry Analytical
ISSN journal
09370633
Volume
351
Issue
7
Year of publication
1995
Pages
614 - 617
Database
ISI
SICI code
0937-0633(1995)351:7<614:FAOHCL>2.0.ZU;2-U
Abstract
A method for the flow injection analysis (FIA) of high concentrations of chloride in electroplating baths using potentiometric detection is proposed. The system includes a unit of dialysis to promote dilution o f samples and a tubular electrode with an homogeneous crystalline memb rane as detector. The system was optimized in order to analyse samples within a broad range of concentrations and at high levels of chloride , thereby making pretreatment of the samples unnecessary. It results i n a simple manifold applicable over the 4.0 x 10(-2) and 3.0 mol L(-1) range with a throughput of about 30 samples/h. Seven different platin g bath samples were analysed by the proposed method and the quality of the results compared with those obtained by the conventional procedur e. Satisfactory agreement was observed.