THE IMEC CLEAN - A NEW CONCEPT FOR PARTICLE AND METAL REMOVAL ON SI SURFACES

Authors
MEURIS M MERTENS PW OPDEBEECK A SCHMIDT HF DEPAS M VEREECKE G HEYNS MM PHILIPOSSIAN A
Citation
M. Meuris et al., THE IMEC CLEAN - A NEW CONCEPT FOR PARTICLE AND METAL REMOVAL ON SI SURFACES, Solid state technology, 38(7), 1995, pp. 109
Citations number
19
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied","Physics, Condensed Matter
Journal title
Solid state technology → ACNP
ISSN journal
0038111X
Volume
38
Issue
7
Year of publication
1995
Database
ISI
SICI code
0038-111X(1995)38:7<109:TIC-AN>2.0.ZU;2-0
Abstract
This article describes the IMEC clean concept, a simple two-step clean ing method based on oxidation and oxide removal. This clean has excell ent particle and metal removal efficiencies and minimal surface roughe ning. Electrical breakdown measurements show Very good gate-oxide inte grity as well.