TOXIC GAS REGULATIONS AND RECOMMENDED MONITORING

Authors
Citation
Lp. Pham et Dt. Pham, TOXIC GAS REGULATIONS AND RECOMMENDED MONITORING, Solid state technology, 38(7), 1995, pp. 125-129
Citations number
9
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied","Physics, Condensed Matter
Journal title
ISSN journal
0038111X
Volume
38
Issue
7
Year of publication
1995
Pages
125 - 129
Database
ISI
SICI code
0038-111X(1995)38:7<125:TGRARM>2.0.ZU;2-G
Abstract
Developing a successful toxic monitoring strategy for semiconductor ma nufacturing is neither easy nor straightforward. Different definitions of hazards and varying acceptable exposure levels require that: safet y professionals coordinate vast quantities of information. Federal fir e codes and regulations may also be vague, and they can change signifi cantly from year to year. Since monitoring systems exist to reduce ris k and provide a safe working environment, there are times when minimal compliance with regulations is not sufficient. To arrive at a safe an d cost-effective solution, the specific requirements of each facility need to be well understood, including facility air flows and sensor ch aracteristics of the fire safety system. Though complete detection sys tems are expensive, cutting corners is both dangerous and costly.