FERROELECTRIC PROPERTIES OF BI2VO5.5 THIN-FILMS ON LAALO3 AND SIO2 SISUBSTRATES WITH LANIO3 BASE ELECTRODE/

Authors
SATYALAKSHMI KM VARMA KBR HEDGE MS
Citation
Km. Satyalakshmi et al., FERROELECTRIC PROPERTIES OF BI2VO5.5 THIN-FILMS ON LAALO3 AND SIO2 SISUBSTRATES WITH LANIO3 BASE ELECTRODE/, Journal of applied physics, 78(2), 1995, pp. 1160-1164
Citations number
21
Categorie Soggetti
Physics, Applied
Journal title
Journal of applied physics → ACNP
ISSN journal
00218979
Volume
78
Issue
2
Year of publication
1995
Pages
1160 - 1164
Database
ISI
SICI code
0021-8979(1995)78:2<1160:FPOBTO>2.0.ZU;2-6