TEMPERATURE AND CONCENTRATION PROFILES IN A LOW-PRESSURE METHANE PROCESS PLASMA

Authors
HADRICH S PFELZER B DOERK T JAUERNIK P UHLENBUSCH J
Citation
S. Hadrich et al., TEMPERATURE AND CONCENTRATION PROFILES IN A LOW-PRESSURE METHANE PROCESS PLASMA, Journal of applied physics, 78(2), 1995, pp. 1297-1302
Citations number
17
Categorie Soggetti
Physics, Applied
Journal title
Journal of applied physics → ACNP
ISSN journal
00218979
Volume
78
Issue
2
Year of publication
1995
Pages
1297 - 1302
Database
ISI
SICI code
0021-8979(1995)78:2<1297:TACPIA>2.0.ZU;2-6