ADSORPTION OF COLLOIDAL PARTICLES IN THE PRESENCE OF EXTERNAL FIELDS

We present a new class of sequential adsorption models in which the ad sorbing particles reach the surface following an inclined direction (s hadow models). Capillary electrophoresis, adsorption in the presence o f a shear, and adsorption on an inclined substrate are physical manife stations of these models. Numerical simulations are carried out to sho w how the new adsorption mechanisms are responsible for the formation of more ordered adsorbed layers and have important implications in the kinetics, in particular, modifying the jamming limit.