INTERLAYER MASS-TRANSPORT IN HOMOEPITAXIAL AND HETEROEPITAXIAL METAL GROWTH

Citation
K. Bromann et al., INTERLAYER MASS-TRANSPORT IN HOMOEPITAXIAL AND HETEROEPITAXIAL METAL GROWTH, Physical review letters, 75(4), 1995, pp. 677-680
Citations number
28
Categorie Soggetti
Physics
Journal title
ISSN journal
00319007
Volume
75
Issue
4
Year of publication
1995
Pages
677 - 680
Database
ISI
SICI code
0031-9007(1995)75:4<677:IMIHAH>2.0.ZU;2-S
Abstract
We describe a general method for the quantitative determination of the interlayer mass transport in epitaxial growth. Through measurement of the nucleation rate on top of islands as a function of island size an d temperature, the additional barrier for an adatom to descend the ste p edge Delta E(s) can be determined with high accuracy. This approach is applied to the growth of Ag on the (111) surfaces of Ag and Pt. In the homoepitaxial system, the barrier is found to be Delta E(s) = 120 +/- 15 meV, whereas in the heteroepitaxial case it is substantially lo wered, Delta E(s) = 30 +/- 5 meV.