X-ray photoelectron spectroscopy has been used to examine the surface
of a series of Cr100-xPx alloys (x = 0, 7, 13, 28) following a variety
of electrochemical treatments in 1 mol/l H2SO4. At oxidizing potentia
ls the passivating effect of the surface film formed on Cr100-xPx is s
imilar to that found on chromium. Semi-quantitative analysis indicates
a minor amount of oxidized phosphorus in the passive film formed on C
r87P13, while a much larger concentration of oxidized phosphorus is fo
und in the passive film on Cr72P28 and Cr93P7. Phosphorus is also slig
htly enriched in the metallic state beneath the oxide-based film. The
thickness of the passivating overlayer is a monotonic function of the
growth potential. At reducing potentials the surface of Cr72P28 is enr
iched in both oxidized and metallic phosphorus via selective dissoluti
on of chromium. This layer inhibits further chromium dissolution and s
imultaneously accelerates proton reduction. The coupling of these reac
tions is responsible for spontaneous passivation of Cr100-xPx in reduc
ing acids.