THE ANODIC-OXIDATION OF VALVE METALS .3. TRANSPORT PROCESSES AND THEIR CORRELATION WITH FILM CONTAMINATION BY FLUORIDE AS MEASURED BY XPS

Authors
KHALIL N LEACH JSL
Citation
N. Khalil et Jsl. Leach, THE ANODIC-OXIDATION OF VALVE METALS .3. TRANSPORT PROCESSES AND THEIR CORRELATION WITH FILM CONTAMINATION BY FLUORIDE AS MEASURED BY XPS, Electrochimica acta, 40(11), 1995, pp. 1769-1772
Citations number
18
Categorie Soggetti
Electrochemistry
Journal title
Electrochimica acta → ACNP
ISSN journal
00134686
Volume
40
Issue
11
Year of publication
1995
Pages
1769 - 1772
Database
ISI
SICI code
0013-4686(1995)40:11<1769:TAOVM.>2.0.ZU;2-1
Abstract
The effect of fluoride ion incorporation on the ionic transport proces ses during anodic oxidation of zirconium has been studied using an alp ha-particle spectrometry technique. X-ray photo-electron spectroscopy (XPS) measurements permit correlation between oxide composition and ch anges in oxide properties. The incorporated fluoride ions appear to af fect the oxide growth field, but not the ionic transport numbers.