AN APPLICATION OF CONFOCAL SCANNING BEAM LASER MICROSCOPY (CSBLM) TO THE ELECTRODEPOSITION OF COPPER

Citation
X. Ling et al., AN APPLICATION OF CONFOCAL SCANNING BEAM LASER MICROSCOPY (CSBLM) TO THE ELECTRODEPOSITION OF COPPER, Electrochimica acta, 40(11), 1995, pp. 1789-1793
Citations number
20
Categorie Soggetti
Electrochemistry
Journal title
ISSN journal
00134686
Volume
40
Issue
11
Year of publication
1995
Pages
1789 - 1793
Database
ISI
SICI code
0013-4686(1995)40:11<1789:AAOCSB>2.0.ZU;2-T
Abstract
Structural characteristics of copper electrodeposition in a laboratory -scale copper electrorefining cell, studied by confocal scanning beam laser microscopy (CSBLM), are presented. Quantitative description of t he roughness of the surface is provided by three-dimensional reconstru cted images, and sectional depth profiles of the surface via digital i mage processing are shown along with surface roughness distribution. Q uantitative information about the effect of current density on surface roughness is of direct interest to industrial copper electrorefining.