Authors
Citation
Da. Bell et al., DESORPTION OF TUNGSTEN FLUORIDES FROM TUNGSTEN, Journal of the Electrochemical Society, 142(7), 1995, pp. 2401-2404
Citations number
29
Categorie Soggetti
Electrochemistry
Journal title
ISSN journal
00134651
Volume
142
Issue
7
Year of publication
1995
Pages
2401 - 2404
Database
ISI
SICI code
0013-4651(1995)142:7<2401:DOTFFT>2.0.ZU;2-T
Abstract
Tungsten hexafluoride adsorbs on tungsten surfaces and reacts to form
WF5, which desorbs at about 250 K. At higher temperatures, WF6 desorbs
. Tungsten fluoride desorption was not affected by co-adsorption of H-
2 or H2O2 so production of WF5 appears to be an unavoidable feature of
tungsten chemical vapor deposition processes based on WF6. The initia
l sticking coefficient for WF6 on tungsten at 240 K is about 10(-3).