INFRARED-ABSORPTION IN THICK-FILM RESISTORS

Citation
B. Ulug et al., INFRARED-ABSORPTION IN THICK-FILM RESISTORS, Journal of Materials Science, 30(13), 1995, pp. 3346-3350
Citations number
12
Categorie Soggetti
Material Science
ISSN journal
00222461
Volume
30
Issue
13
Year of publication
1995
Pages
3346 - 3350
Database
ISI
SICI code
0022-2461(1995)30:13<3346:IITR>2.0.ZU;2-2
Abstract
Infrared absorption in polymer and glass-based thick film resistors ha s been measured between 400 and 1500 cm(-1). Sam pie structures are di scussed on the basis of X-ray, Fourier transform-infrared and resistan ce-temperature data. It is shown that in polymer-based thick film resi stors, the particulate phase is mostly responsible for the infrared ab sorption between 400 and 900 cm(-1), whereas the infrared absorption a t higher wave numbers is related to the continuous phase. In glass-bas ed thick film resistors, absorption is mostly determined by the highly doped glass. The results indicate that thick film resistors can be us ed as an absorbent coating in the 400-1500 cm(-1) region by suitable s election of the continuous and particulate phases.