IN-SITU ANNEALING STUDIES OF SOL-GEL FERROELECTRIC THIN-FILMS BY SPECTROSCOPIC ELLIPSOMETRY

Citation
S. Troliermckinstry et al., IN-SITU ANNEALING STUDIES OF SOL-GEL FERROELECTRIC THIN-FILMS BY SPECTROSCOPIC ELLIPSOMETRY, Journal of the American Ceramic Society, 78(7), 1995, pp. 1907-1913
Citations number
17
Categorie Soggetti
Material Science, Ceramics
ISSN journal
00027820
Volume
78
Issue
7
Year of publication
1995
Pages
1907 - 1913
Database
ISI
SICI code
0002-7820(1995)78:7<1907:IASOSF>2.0.ZU;2-P
Abstract
Spectroscopic ellipsometry was utilized to follow in situ the annealin g of sol-gel Pb(Zr,Ti)O-3 films on sapphire and platinum-coated silico n substrates. Low-temperature processes, such as pyrolysis of organics and film densification, could be identified readily, Crystallization of the perovskite phase was initiated between 500 degrees and 600 degr ees C for the film on sapphire, This was coincident with the roughenin g of the film surface, Identification of higher-temperature processes in the film on platinum-coated silicon was complicated by temperature- dependent changes in the substrate, In situ annealing studies on the s ubstrate alone confirmed that, for the lengthy annealing profiles util ized in these experiments, substantial and irreversible changes in the effective substrate dielectric function occurred at temperatures >550 degrees C, In addition, the role of extended, high-temperature anneal ing on the optical frequency dielectric properties of the films was in vestigated.