X-RAY STUDY OF GROWING WETTING FILMS

X-ray scattering experiments of liquid films on top of solid substrate s were performed. With a short pulse disturbance, caused by a temperat ure difference between the substrate and the vapour in the X-ray cell, the wetting film thickness is reduced. Afterwards the time dependence of the growing film is monitored by X-ray reflectivity measurements i n the region of total external reflection. We have examined CCl4- and CCl3Br-films on top of silicon wafers and CCl3Br on glass/gold and gla ss/silver substrates. The film thickness as function of time is explai ned by the Kolmogorov growth model. From the data we obtain rather lon g time constants and the dimension d = 2 of the growing process