V. Schmatloch et al., TOWARDS AN OSCILLATION MECHANISM FOR THE NO-CO REACTION ON RH(110) - NO DISSOCIATION KINETICS AND OXYGEN SUBSURFACE DIFFUSION, Surface science, 333, 1995, pp. 23-29
The reaction between NO and CO on Rh{110} has been found to show hyste
resis effects as well as self-sustained rate oscillations at high temp
eratures (above 900 K). For certain CO/NO partial pressure ratios two
modes of oscillation with different periods and amplitudes may be supe
rimposed. In order to understand the oscillation mechanism, we studied
the NO dissociation kinetics by means of temperature programmed desor
ption (TPD), monochromatized X-ray photoelectron spectroscopy (MXPS),
ion scattering spectroscopy (ISS) and static secondary ion mass spectr
oscopy (SSIMS). At higher NO coverages the dissociation process has be
en found to be hindered and shifted to the range of temperatures where
thermal desorption of nitric oxide and nitrogen molecules takes place
(above 300 K) as well. Work function measurements and titration exper
iments with CO have provided evidence that oxygen atoms released durin
g NO dissociation can diffuse into the subsurface region of the crysta
l. The reversibility of this process may play an important role in the
oscillation mechanism of the NO-CO reaction on Rh{110} although some
of the results might be explained by assuming a subtle balance with an
oxidation process.