FABRICATION OF TITANIUM-OXIDE THIN-FILMS BY CONTROLLED GROWTH WITH SEQUENTIAL SURFACE CHEMICAL-REACTIONS

Controlled growth of titanium oxide films by sequential surface chemic al reactions was studied using a novel vapor combination of tetrachlor otitanium (TiCl4) and hydrogen peroxide (H2O2). Optical constants and thicknesses of these films were investigated in terms of growth temper ature and vapor pressures by using a variable-angle spectroscopic elli psometer. Growth rates were almost constant at approximately 0.065 nm cycle(-1) (= 0.65 nm min(-1)) for substrate temperatures from 340 degr ees C to 490 degrees C. Indices of refraction were also constant at 2. 6 in almost the same temperature range.