The incorporation of nitrogen in oxides has been studied after furnace
oxidation in N2O at 900 degrees C. We observe that nitrogen is remove
d from the oxide bulk during oxidation in N2O, while simultaneously ni
trogen is incorporated at the growing Si-SiO2 interface. This results
suggests that nitrogen incorporation involves a dynamic equilibrium be
tween competing processes which causes both nitrogen incorporation and
depletion. A chemical model for nitrogen removal is proposed based on
a reaction with NO. Reaction energies, estimated from semiempirical q
uantum-mechanical calculations, support the proposed model. (C) 1995 A
merican Institute of Physics.