PHOTOEMISSION-STUDY ON OXIDATION OF THE Y-CU INTERMETALLIC COMPOUND ON CU(100) SURFACE

Authors
Citation
Xm. Liu et al., PHOTOEMISSION-STUDY ON OXIDATION OF THE Y-CU INTERMETALLIC COMPOUND ON CU(100) SURFACE, Applied surface science, 108(2), 1997, pp. 237-244
Citations number
21
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
108
Issue
2
Year of publication
1997
Pages
237 - 244
Database
ISI
SICI code
0169-4332(1997)108:2<237:POOOTY>2.0.ZU;2-P
Abstract
Oxidation of Y-Cu intermetallic compound on the Cu(100) surface at roo m temperature has been studied by X-ray photoelectron spectroscopy and ultraviolet photoelectron spectroscopy. It is found that the Y-Cu com pound films are easily oxidized to form yttrium oxide at room temperat ure. The formed oxide prevents the Y atoms from diffusing into the top most surface. Valence band and core level photoelectron spectra indica te the presence of chemisorbed oxygen species (O-) which are formed on top of the yttrium oxide at high oxygen exposure. On annealing, the O - ions can react with metallic yttrium continuously at medium temperat ure, and a uniform Y2O3 layer is formed on the Cu(100) surface.