Donor-type interface states, generated by vacuum ultraviolet irradiati
on have been studied. They anneal at room temperature but only when in
a neutral state. This anneal is accompanied by the release of atomic
hydrogen. It is proposed that the states are formed by H loosely bonde
d to sites in the SiO2 network at or near the interface. Anneal would
take place by removal of H. Capturing a hole would strengthen the bond
between H and the network site.