INTERFACE INSTABILITY IN AN ELECTRIC-FIELD

Authors
Citation
L. Klinger et L. Levin, INTERFACE INSTABILITY IN AN ELECTRIC-FIELD, Journal of applied physics, 78(3), 1995, pp. 1669-1672
Citations number
11
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
78
Issue
3
Year of publication
1995
Pages
1669 - 1672
Database
ISI
SICI code
0021-8979(1995)78:3<1669:IIIAE>2.0.ZU;2-E
Abstract
We have studied morphological changes of an interface in a strong elec tric field which is normal to the initially planar interface. Electrom igration along the interface in a two phase metallic system A-B of the immiscible components has been considered. The stresses arising durin g electromigration of the components were taken into account. A nonlin ear equation has been derived for the interface evolution in the elect ric field, allowing for curvature of the interface. It was shown that the interface diffusion in an electric held leads to the formation of a periodic corrugation on the interface if the components are distingu ished by their electric charges. The corrugation increases with time a nd is transformed into a channel-hillock-like structure. The nonlinear equation was analyzed numerically for the steady-state case. The shap e and the growth rate of hillocks on the interface have been calculate d. (C) 1995 American Institute of Physics.