Xj. Cai et Jc. Williams, PILOT-STUDY OF THE ANALYTICAL PERFORMANCE OF THE PULSED HOLLOW-CATHODE DISCHARGE EMISSION SOURCE, Applied spectroscopy, 49(7), 1995, pp. 890-899
Proper conditioning of the hollow cathode by sputtering is critical to
the analytical performance of the hollow cathode. A pulsed discharge
procedure was developed to condition the 1.5- x 5-mm stainless steel c
athode. A scanning electron microscope was used to study the surface s
tructure resulting from the conditioning. The resulting hollow bottom
was bulb-shaped and the surface was mirror-like, very smooth, and shin
y. The emission intensities from smooth cathodes were greater that tho
se from the rough ones. The precision obtained here was 3-5% for Na, 5
-8% for Li, and 4-10% for K. Three working curves for each element wer
e made on different days with different cathodes that had been conditi
oned in the same manner for 4 h by sputtering, The three working curve
s virtually coincided when plotted in the same figure, demonstrating t
he precision and reproducibility from day to day of the hollow cathode
discharge method as developed in this laboratory. The 3-sigma detecti
on limits calculated from slopes of corking curves are 0.32 pg, 0.35 p
g, and and 3.2 pg for Na, Li, and K, respectively.