DISSOCIATIVE PHOTOIONIZATION OF BIS(DIMETHYL-MU-ISOPROPYLAMIDO-ALUMINUM) AND BIS(DIMETHYL-MU-T-BUTYLAMIDO-ALUMINUM) IN THE REGION HV=65-133EV BY MASS-SPECTROMETRY

Authors
PARK SM BOO BH KIM Y PARK JT KOYANO I
Citation
Sm. Park et al., DISSOCIATIVE PHOTOIONIZATION OF BIS(DIMETHYL-MU-ISOPROPYLAMIDO-ALUMINUM) AND BIS(DIMETHYL-MU-T-BUTYLAMIDO-ALUMINUM) IN THE REGION HV=65-133EV BY MASS-SPECTROMETRY, JPN J A P 2, 34(7B), 1995, pp. 933-936
Citations number
10
Categorie Soggetti
Physics, Applied
Journal title
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS → ACNP
Volume
34
Issue
7B
Year of publication
1995
Pages
933 - 936
Database
ISI
SICI code
Abstract
The dissociative photoionization studies of bis(dimethyl-mu-isopropyla mido-aluminum) and bis(dimethyl-mu-t-butylamido-aluminum) in the photo n energy range of 67-133 eV have been performed as preliminary studies of synchrotron radiation single-precursor chemical vapor deposition. Photoelectron-photoion coincidence and photoion-photoion coincidence m ass spectra are analyzed to understand the effects of Al:2p and Al:2s core excitation on the branching ratios of photofragments produced by absorption of synchrotron radiation.