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Robotic transfer of silicon wafers in semiconductor fabrication facili
ties is becoming increasingly attractive. This paper discusses the ben
efits of a DSP-based computed torque controller over standard PID algo
rithms for a three degree of freedom, cleanroom material transfer mani
pulator. Formulation of robot kinematics, dynamic modeling, and numeri
cal simulation assist in the implementation of this nonlinear controll
er. Simulation and experimental data correlate well and show that a fa
ctor of 2-3 times improvement in performance can be obtained.