CATHODOLUMINESCENCE STUDY OF GAAS QUANTUM-WELLS AND OF SUBMICRON DOTSFABRICATED BY MAGNETRON REACTIVE ION ETCHING

Citation
Ll. Chao et al., CATHODOLUMINESCENCE STUDY OF GAAS QUANTUM-WELLS AND OF SUBMICRON DOTSFABRICATED BY MAGNETRON REACTIVE ION ETCHING, Applied physics letters, 70(4), 1997, pp. 408-410
Citations number
11
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
70
Issue
4
Year of publication
1997
Pages
408 - 410
Database
ISI
SICI code
0003-6951(1997)70:4<408:CSOGQA>2.0.ZU;2-R
Abstract
Cathodoluminescence has been employed to investigate the luminescence and lateral transport properties of excited carriers at 8 K in GaAs-Al GaAs quantum well material and in submicron features fabricated in thi s material by magnetron reactive ion etching. A carrier diffusion leng th of 0.85+/-0.04 mu m in quantum wells and a surface recombination ve locity (5.4+/-0.8)x 10(3) m/s at etched sidewalls were measured. Also, the effect of feature size on luminescence efficiency was examined an d compared with model calculations using the measured values of diffus ion length and surface recombination velocity. (C) 1997 American Insti tute of Physics.