Ar. Zanatta et al., ERBIUM LUMINESCENCE FROM HYDROGENATED AMORPHOUS SILICON-ERBIUM PREPARED BY COSPUTTERING, Applied physics letters, 70(4), 1997, pp. 511-513
Hydrogenated amorphous silicon with small amounts of erbium (Er/Si con
centration similar to 5 at.%) was prepared by radio frequency sputteri
ng from a Si target partially covered by tiny metallic Er chunks. Four
sets of samples were studied: nonintentionally contaminated hydrogena
ted and nonhydrogenated amorphous silicon-erbium (a-SiEr:H and a-SiEr)
; nitrogen doped a-SiEr(N):H and oxygen contaminated a-SiEr(O):H. Samp
les from the first two sets present only faint 1.54 mu m photoluminesc
ence characteristic from Er3+ ions even at 77 K. Samples from the othe
r sets show this luminescence at 77 K as deposited, without any furthe
r annealing step. Thermal annealing up to 500 degrees C increases the
photoluminescence intensity, and room temperature emissions become str
ong enough to be easily detected. These results indicate that in an am
orphous silicon environment the chemical neighborhood of the Er3+ ions
is crucial for efficient 1.54 mu m emission. Raman scattering from bo
th as-deposited and annealed samples showed that network disorder rela
xation by annealing is not determinant for efficient Er3+ luminescence
. (C) 1997 American Institute of Physics.