Pk. Shon et al., THE VOID FRACTION OF RF-SPUTTERED SRTIO3 FILM CHARACTERIZED BY SPECTROSCOPIC ELLIPSOMETRY, Solid state communications, 95(9), 1995, pp. 609-612
RF-sputtered SrTiO3 thin film was investigated by Spectroscopic Ellips
ometry. The spectra calculated by using Brugman-Effective Medium Appro
ximation theory compared with the experimental curves for delta and ps
i of SrTiO3 thin films. Good agreement was found between experimental
and calculated curves. The effective void fraction obtained in experim
ents is 28-38 % with difference thickness of SrTiO3 films. The decreas
e in void fraction with increasing O-2 pressure during reactive sputte
ring growth was explained in terms of non-stoichiometry of the oxygen.