GAS CLUSTER ION-BEAM EQUIPMENTS FOR INDUSTRIAL APPLICATIONS

Citation
J. Matsuo et al., GAS CLUSTER ION-BEAM EQUIPMENTS FOR INDUSTRIAL APPLICATIONS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 99(1-4), 1995, pp. 244-247
Citations number
12
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
ISSN journal
0168583X
Volume
99
Issue
1-4
Year of publication
1995
Pages
244 - 247
Database
ISI
SICI code
0168-583X(1995)99:1-4<244:GCIEFI>2.0.ZU;2-B
Abstract
30 keV and 200 keV gas cluster ion beam equipments have been developed for industrial applications. A gas cluster source with a non-cooled n ozzle was used for both the equipments. Sufficient monomer ion suppres sion was achieved by using an E X B filter and chromatic lenses mass f ilter with low extraction voltage. These equipments are suitable to be used for low-damage surface treatment of metals, insulators and semic onductors without heavy metal contamination.