J. Matsuo et al., GAS CLUSTER ION-BEAM EQUIPMENTS FOR INDUSTRIAL APPLICATIONS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 99(1-4), 1995, pp. 244-247
30 keV and 200 keV gas cluster ion beam equipments have been developed
for industrial applications. A gas cluster source with a non-cooled n
ozzle was used for both the equipments. Sufficient monomer ion suppres
sion was achieved by using an E X B filter and chromatic lenses mass f
ilter with low extraction voltage. These equipments are suitable to be
used for low-damage surface treatment of metals, insulators and semic
onductors without heavy metal contamination.