HIGH-CURRENT ION-IMPLANTATION BY PLASMA IMMERSION TECHNIQUE

Authors
THOMAE RW SEILER B BENDER H BRUTSCHER J GUNZEL R HALDER J KLEIN H MULLER J SARSTEDT M
Citation
Rw. Thomae et al., HIGH-CURRENT ION-IMPLANTATION BY PLASMA IMMERSION TECHNIQUE, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 99(1-4), 1995, pp. 569-572
Citations number
6
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
Journal title
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms → ACNP
ISSN journal
0168583X
Volume
99
Issue
1-4
Year of publication
1995
Pages
569 - 572
Database
ISI
SICI code
0168-583X(1995)99:1-4<569:HIBPIT>2.0.ZU;2-R
Abstract
Plasma immersion ion implantation (PIII) is a novel technique which is under investigation at several laboratories. In this paper we present a short review on existing experiments and work which is done at the Frankfurt PIII experiment.