M. Katayama et al., SURFACE AND INTERFACE STRUCTURAL CONTROL USING COAXIAL IMPACT-COLLISION ION-SCATTERING SPECTROSCOPY (CAICISS), Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 99(1-4), 1995, pp. 598-601
We have developed a system in which molecular-beam epitaxy (MBE) equip
ment for film growth and a coaxial impact-collision ion scattering spe
ctroscopy (CAICISS) apparatus for monitoring the film growth are combi
ned through a computer-controlled feedback mechanism. Using this syste
m, the coverage of surfactant, Bi or Sb, in the growth of Ge on the Si
(001) surface has been automatically kept at predetermined values duri
ng the growth of Ge. The mixing of Ge and Si at the Ge/Si(001) interfa
ce is largely suppressed and the crystalline quality of the grown Ge f
ilm is improved as the coverage of surfactant increases.