B. Brijs et al., STOICHIOMETRY CHANGES DURING LOW-ENERGY OXYGEN BOMBARDMENT, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 99(1-4), 1995, pp. 614-618
A basic understanding of the sputter induced artifacts during low ener
gy oxygen ion beam bombardment is of great importance for a correct ev
aluation of the results of sputter depth profiling in SIMS. In this pa
per the sputter depth-profiling of Si, CoSi2 and TiSi2 under normal ox
ygen bombardment has been investigated. With the combined sputter/RBS
set-up and in combination with ex-situ XPS measurements, the oxidation
and near-surface compositional changes in the transient region have b
een explained.