2D AND 3D THIN-FILM FORMATION AND GROWTH MECHANISMS IN METAL ELECTROCRYSTALLIZATION - AN ATOMISTIC VIEW BY IN-SITU STM

Citation
Wj. Lorenz et G. Staikov, 2D AND 3D THIN-FILM FORMATION AND GROWTH MECHANISMS IN METAL ELECTROCRYSTALLIZATION - AN ATOMISTIC VIEW BY IN-SITU STM, Surface science, 335(1-3), 1995, pp. 32-43
Citations number
56
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
00396028
Volume
335
Issue
1-3
Year of publication
1995
Pages
32 - 43
Database
ISI
SICI code
0039-6028(1995)335:1-3<32:2A3TFA>2.0.ZU;2-R
Abstract
Different nucleation and growth mechanisms (Volmer-Weber, Frank-van de r Merwe, and Stranski-Krastanov) have been found to operate in electro crystallization and ultra-thin film formation of metals, Me, on foreig n substrates, S, where 2D UPD Me adlayers on S can act as precursors f or the subsequent nucleation and growth. Modern techniques, particular ly in situ STM with lateral atomic resolution, give direct insight int o the initial steps of the formation of 2D UPD Me adlayers, thin Me fi lms, and 3D Me bulk phases.