K. Meijvogel et Ajj. Bos, INFLUENCE OF THERMAL TREATMENTS ON GLOW CURVE AND THERMOLUMINESCENCE EMISSION-SPECTRA OF LIF-MG,CU,P, Radiation measurements, 24(3), 1995, pp. 239-247
LiF:Mg,Cu,P is a highly sensitive thermoluminescence material, but los
es its sensitivity if annealed at temperatures above 513 K. In this pa
per, the effects of these annealing temperatures on GR-200A samples ar
e investigated and quantified. The changes in the glow curve and the e
mission spectrum are investigated as a function of annealing temperatu
re and cooling rate. The return of up to 79% of its sensitivity (after
a 633 K for 10 min treatment) is found with a special thermal treatme
nt including a cooling at 40 K min(-1) down to 513 K and a dwell time
at that temperature for 10 min. Treatments above 513 K lead to both ir
reversible and reversible processes in the material. A return of TL in
the main glow peak is coupled with a decrease of the TL in the high t
emperature region, which is the main source of the residual signal. An
alysis of the emission spectrum shows two emission bands at 347 and 37
7 nm, of which the latter is influenced by the annealing procedure and
can be correlated with the main glow peak, and the other with the res
idual signal. A comparison with X-ray induced emission spectra indicat
es that the luminescence processes in LiF:Mg,Cu,P materials may be exp
lained by centre-to-centre recombination.