ELECTRON-BEAM MODIFICATION OF SILICATE GLASS SURFACES

Silicate glass surface modification under low-energy (< 5 keV) electro n-beam treatment in vacuum has been analyzed in this paper. It is show n that the irradiation leads to surface layer leaching (up to 10(3) nm ) as a result of thermostimulated diffusion and desorption processes u nder limited component inflow from the bulk glass. The analyses of the 1s oxygen spectra and infrared reflectance spectra have shown that th e ion-modifier depletion is followed by a decrease in non-bridging oxy gen content in the surface layer and a modified layer polymerization. Analytical relationships are suggested and the estimation of the desor ption process intensity is given.