INFLUENCE OF DEPOSITION PARAMETERS ON LASER-ABLATION DEPOSITED AMORPHOUS-CARBON

Thin amorphous carbon films were deposited by KrF laser ablation from graphite and glassy carbon targets at different substrate temperatures with beam power density on the target of 3 X 10(8) W cm(-2). The film s were characterized by electrical resistivity, spectroscopic ellipsom etry, ultraviolet transmission, visible and infrared spectra and Raman spectroscopy. The influence on film properties of substrate temperatu re during deposition varying from room temperature to 425 degrees C wa s studied. The influence of the temperature and film thickness on the film buckling was also studied. A film resistivity of 10(8) Omega cm a nd an optical band gap energy of 1.9 eV was achieved. Raman spectra wi th low D band(I-D/I-G = 0.46) intensity were obtained.