THE STUDY ON CHARGE-DENSITY DISTRIBUTION IN TIAL BY QUANTITATIVE ELECTRON CRYSTALLOGRAPHY METHOD

Structure factors of gamma-TiAl equiaxed grain in TiAl duplex intermet allic compound before and after V-alloying were measured by the quanti tative electron crystallography method. Then the structure factors wer e transferred into charge-density distributions of real space. Compari ng the charge-density distributions in gamma-TiAl with those in V-allo yed gamma-TiAl, it was found that V-alloying with the optimum amount d ecreases the electronic charge density in the Ti-Ti interatomic bond, and increases the electronic charge density in the Al-Al interatomic b ond and Ti-Al interatomic bond. Thus, the anisotropy of charge-density distribution in gamma-TiAl equiaxed grain is reduced.