S. Billat et al., ELECTROLUMINESCENCE OF HEAVILY-DOPED P-TYPE POROUS SILICON UNDER ELECTROCHEMICAL OXIDATION IN THE POTENTIOSTATIC REGIME, Thin solid films, 263(2), 1995, pp. 238-242
Visible light emission is obtained during the anodic oxidation of heav
ily doped p-type porous silicon layers, with similar characteristics t
o the electroluminescence observed on lightly doped substrates. This i
ndicates that the coarser structure of the heavily doped layers also p
resents a thinner structure, with crystallites of quantum sizes respon
sible for the emission. In this paper, the electroluminescence is stud
ied in potentiostatic conditions, under either fixed or scanned potent
ials. Some reversibility in the spectral changes versus potential vari
ations can be evidenced by selecting correctly the scanning conditions
and the potential values. The results allow one to conclude that the
electroluminescence spectral evolution is mostly determined by the app
lied polarisation and can be attributed to the selectivity of the carr
iers injection into the quantum-size crystallites of the material. The
electroluminescence vanishing which is observed in the second part of
the anodic oxidation regime seems related in the higher potential ran
ge to some depassivation of the porous silicon surface. For the lower
potential range, owing to the oxide growth, the emission stops when th
e polarisation is no longer enough to inject holes into the confined c
rystallites.