HIGH-CARRIER-FREQUENCY FAN-OUT GRATINGS FABRICATED BY TOTAL INTERNAL-REFLECTION HOLOGRAPHIC LITHOGRAPHY

Total internal reflection (TIR) holographic lithography is applied to the fabrication of binary diffractive optical elements with submicrome ter surface relief features. The recording conditions for the intermed iate TIR volume hologram, used for high-resolution proximity printing, are discussed. In particular, the fabrication of efficient high-carri er-frequency fan-out gratings is considered and experimental results a re presented for an off-axis 9 x 1 fan-out element in photoresist with a carrier frequency of 1000 lines/mm.