Tv. Torchinskaya et al., DEEP CENTERS IN INXGA1-XAS INP PHOTODIODES FABRICATED BY METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION/, Semiconductors, 29(7), 1995, pp. 692-694
Deep centers in epitaxial layers of In0.53Ga(0.47)As grown by metal-or
ganic chemical vapor depostion have been studied by DLTS. Trapping cen
ters of three types for majority carriers (electrons), with energies E
(c) - 0.12, E(c) - 0.30, and E(c) - 0.38 eV, were observed in the spac
e-charge region of InxGa1-xAs/InP p-i-n photodiodes fabricated from th
ese layers. The last two of these trapping centers are centers of nonr
adiative recombination. The relationship between the reverse current o
f the photodiodes and the presence of one of these centers in the spac
e-charge region is discussed. (C) 1995 American Institute of Physics.