CHEMICAL BONDING STUDIES ON UV OZONE-TREATED AND (NH4)(2)S-TREATED INP(001) SURFACES BY X-RAY PHOTOELECTRON-SPECTROSCOPY AND X-RAY-INDUCED AUGER-ELECTRON SPECTROSCOPY/
P. Streubel et al., CHEMICAL BONDING STUDIES ON UV OZONE-TREATED AND (NH4)(2)S-TREATED INP(001) SURFACES BY X-RAY PHOTOELECTRON-SPECTROSCOPY AND X-RAY-INDUCED AUGER-ELECTRON SPECTROSCOPY/, Surface and interface analysis, 23(9), 1995, pp. 581-588
X-ray photoelectron spectroscopy (XPS) and x-ray-induced Auger electro
n spectroscopy (XAES) have been applied to characterize the surface ch
emistry of InP(001) after ex situ treatment with ozone or with (NH4)(2
)S solution. Both high-resolution chemical shifts and the Auger parame
ter concept were used for the identification of chemical species. Afte
r UV/ozone exposure, indium oxide and two phosphate types (orthophosph
ate and metaphosphate) were found on the InP surface. Upon annealing t
he phosphates desorb first, followed by the oxide. On (NH4)(2)S-treate
d InP surfaces three sulphur species were observed and identified as t
wo different sulphides and as a polysulphide (S-S bond). The thermally
most stable sulphur species was attributed to a sulphide with sulphur
on a phosphorus site in the uppermost subsurface layer. Changes of su
rface Fermi energy position accompanying the surface sulphurization we
re established to correlate with the annealing behaviour of the polysu
lphidic species found at the InP surface.